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Onto Innovation provides advanced process control solutions for semiconductor manufacturing, specializing in inspection, metrology, lithography, and process control software. These integrated technologies deliver data and capabilities for optimizing manufacturing yield, enhancing device performance, and ensuring quality throughout the production cycle.
The company formed in October 2019 from the merger of Rudolph Technologies, Inc. and Nanometrics Incorporated. Vincent J. Coates founded Nanometrics in 1975, establishing optical metrology leadership. Rudolph Technologies, public since 2000, specialized in process control. This consolidation unified expertise, addressing the complexities of modern semiconductor fabrication.
Onto Innovation serves leading global semiconductor manufacturers, supporting advanced device production. Its mission delivers comprehensive process solutions through innovation and collaboration. The company envisions itself as the essential technology partner for next-generation semiconductor scaling and heterogeneous packaging, fostering smarter, faster, and more efficient operations for its customers.
Key people at Onto Innovation.
Key people at Onto Innovation.